The Sato International Scholarship Foundation grants two types of scholarship for self-supporting students from ASEAN countries as well as Southwest Asian countries enrolled in a Japanese undergraduate or graduate institution:
1. Scholarship for Self-Supporting Students
2. Scholarship for Short-Term Exchange Students
Students from the Following Countries are Eligible to Apply:
Bangladesh, Bhutan, Brunei, Cambodia, India, Indonesia, Laos, Malaysia, Maldives, Myanmar, Nepal, Pakistan, Philippines, Singapore, Sri Lanka, Thailand, East Timor, Vietnam.
Scholarship for Self-Supporting Students
The applicant must be residing in Japan, enrolled in or accepted to a legitimate program. Please apply through the students’ office of your university.
Amount of Scholarship:
Undergraduate students: 120,000 yen/month
Graduate students: 180,000 yen/month
plus additional support to cover cost for attending conferences
Duration of Scholarship:2 years
Number of Scholarships Granted:Around 10 students will be accepted.
Eligibility:
The applicant must be a citizen from the aforesaid countries, who does not hold Japanese citizenship and must be enrolled in a Japanese undergraduate or graduate institution, under the jurisdiction of the Japanese Ministry of Education, Culture, Sports, Science and Technology.
The applicant must also fulfill the following requirements:
Have interest in promoting international understanding and friendship, and is able to attend SISF meetings (meetings are held 6 times/year).Does not receive any sort of scholarship or funding from other parties.
Holds legal residence status as a college student.
Does not have a parent employed in Japan.
Is enrolled in a program with more than 1 year left until graduation/completion (from April 2011). This restriction does not apply to doctorate program.
Have good communication skill in Japanese.
Selection Process:
Selected by screening committee:
1. First round of selection: review of application form and documents
2. Second round of selection: interview
Deadline: Monday August 23, 2010
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